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Nano-Fab Lab

Courses: EOP 632/ECE 682

  • Design of cleanrooms
  • Contamination control
  • Chemical safety

  • Basic kinetic theory of gases
  • Vacuum pumps
  • Vacuum measurements and diagnostics
  • Gas flow measurement
  • Basic plasma theory
  • DC, RF, parallel plate and magnetron, ICP configurations

  • Properties of silicon and crystal orientations
  • Quartz, fused-silica, III-V substrates
  • Wafer cleaning processes

  • RF and DC sputter deposition
  • Filament and electron-beam evaporation
  • Plasma-enhanced chemical vapor deposition
  • Measuring and controlling film thickness
  • Film stress theory and measurement
  • Optical properties of thin films
  • Optical filter design and fabrication configurations

  • Basic photoresist chemistry
  • Dill parameters for modeling photoresists
  • Positive and negative resists and image reversal
  • Photomask design
  • Contact and projection printing techniques
  • Alignment techniques
  • Thin film lift-off techniques
  • SU8 and thick film processes

  • Etch chemistries and thermodynamics
  • Etch rates, selectivity and masks
  • Plasma etching and ion beam milling
  • Inductively coupled plasma etching

  • Aniosotropic and isotropic etch chemistries
  • Bulk micro-machining for MEMS devices

DOPING AND IMPLANTATION

  • Doping by thermal diffusion
  • Doping by implantation
  • Annealing

MICRO-METROLOGY

  • Surface profilometry
  • Optical thin film characterization
  • Scanning electron microscopy

  • FEOL and BEOL manufacturing phases
  • Damascene process
  • Foundry processes

  • Integrated optical devices and waveguides
  • Photodetectors
  • Diodes and transistors

CONTACT

Nano-Fab Lab, Andrew Sarangan, Ph.D., Director

Fitz Hall
300 College Park
Dayton, Ohio 45469 - 2951
937-229-3190
Email