Electro-Optics Laser Image

Course Information

EOP 501. GEOMETRIC OPTICS
Wavefronts and rays; Fermat's principle; Gaussian optics of axially symmetrical systems; aperture stops; pupils and field lenses; Lagrange invariant; angular and visual magnification; optical systems; plane mirrors and prisms; aberration theory; introduction to computer ray tracing. Prerequisite: acceptance into the EO program or permission of the director. 3 sem. hrs.

EOP 502. OPTICAL RADIATION AND MATTER 
Maxwell's equations; electromagnetic waves; interaction of radiation with atomic electrons; molecular and lattice vibrations; study of phenomena related to the interaction of optical radiation with matter; polarization; crystal optics; nonlinear dielectric effects. Prerequisite: acceptance into the EO program or permission of the director. 3 sem. hrs. 

EOP 505. INTRODUCTION TO LASERS 
Laser theory; coherence; Gaussian beams; optical resonators; properties of atomic and molecular radiation; laser oscillation and amplification; methods of excitation of lasers; characteristics of common lasers; laser applications. Prerequisite: EOP 502 or a working knowledge of Maxwell's Equations and physical optics, or permission of the director. 3 sem. hrs. 

EOP 506. ELECTRO-OPTICAL DEVICES AND SYSTEMS 
Solid-state theory of optoelectronic devices; photoemitters; photodetectors; solar cells; detection and noise; displays; electro-optic, magneto-optic, and acousto-optic modulators; integration and application of electro-optical components in electro-optical systems of various types. Prerequisite: EOP 502, or permission of the director. 3 sem. hrs. 

EOP 513. LINEAR SYSTEMS AND FOURIER OPTICS 
Mathematical techniques-pertaining to linear systems theory; Fresnel and Fraunhoffer diffraction; Fourier transform properties of lenses; interference and Fourier transform spectroscopy; frequency analysis of optical systems, spatial filtering, applications such as optical information processing and holography. Prerequisite: acceptance into the EO program or permission of the director. 3 sem. hrs. 

EOP 514. GUIDED WAVE OPTICS 
Light propagation in slab and cylindrical wave guides; signal degradation in optical fibers; optical sources, detectors, and receivers; coupling; transmission link analysis; fiber fabrication and cabling; fiber sensor system. Prerequisite: EOP 502 or permission of the director. 3 sem. hrs. 

EOP 541L. GEOMETRIC AND PHYSICAL OPTICS LABORATORY 
Geometric optics; characterization of optical elements; diffraction, interference; birefringence and polarization. Prerequisite: EOP 501 or permission of the director. 1 sem. hr. 

EOP 542L. ELECTRO-OPTIC SYSTEMS LABORATORY 
Fiber optic principles and systems: numerical aperture, loss, dispersion, single and multimode fibers, communications and sensing systems; project oriented investigations of electro/fiber-optic systems and devices in general, sources, detectors, image processing, sensor instrumentation and integration, electro-optic components, display technology , and nonlinear optical devices and systems. Prerequisite: EOP 514 or permission of' the director. 1 sem. hr. 

EOP 543L. ADVANCED ELECTRO-OPTICS LABORATORY 
Project-oriented investigations of laser characteristics, interferometry, holography, optical pattern recognition and spectroscopy. Emphasis is on the applications of optics, electronics, computer data acquisition and analysis to measurement problems. Prerequisite: EOP 541L and 542L, or permission of the director. 1 sem hr. 

EOP 595. SPECIAL PROBLEMS IN ELECTRO-OPTICS 
Particular assignments to be a arranged and approved by the director. 2-6 sem. hrs. 

EOP 599. THESIS 1-6 sem hrs. 

EOP 601. OPTICAL DESIGN 
Chromatic aberration; doublet, telephoto, wide-angle, and normal lenses; triplet lens design and variations; optimization methods and computer lens design; optical transfer functions; telescopes and microscopes; two-mirror telescope design; aspheric surfaces; prism and folded optical systems; rangefinders; gratings and holographic optical elements; anamorphic optical systems; zoom systems. Prerequisite: EOP 501. 3 sem. hrs. 

EOP 603. INTERFEROMETRY 
Two-beam interference: wavefront division, amplitude division, localization of fringes, and interferometers; coherence; multiple-beam interference; Fabry-Perot interference and fringes of equal chromatic order; length measurements. Prerequisites: EOP 513. 3 sem. hrs. 

EOP 604. INTEGRATED OPTICS 
Review of electromagnetic principles; dielectric slab waveguides; cylindrical dielectric waveguides; dispersion, shifting and flattening; mode coupling and loss mechanism; selected nonlinear waveguiding effects; integrated optical devices. Prerequisite: EOP 514. 3 sem. hrs. 

EOP 621. STATISTICAL OPTICS 
Optical phenomena and techniques requiring statistical methods for practical understanding and application; relevant statistical techniques for the analysis of image processing systems and the design of laser radar systems; engineering applications of statistical techniques. Prerequisite: completion of the EO core courses or permission of the director. 3 sem. hrs. 

EOP 624. NONLINEAR OPTICS 
Nonlinear optical interactions, classical anharmonic oscillator model; symmetry properties of nonlinear susceptibility tensor; coupled-mode formalism; sum- and difference-frequency generation; parametric oscillators; four-wave mixing; phase conjugation; optical solitons; stimulated Brillouin and Raman scattering; photorefractive effect; resonant nonlinearities. Prerequisite: EOP 502 or equivalent. 3 sem. hrs. 

EOP 626. QUANTUM ELECTRONICS 
Principles of the quantum theory of electron and photon processes; interaction of electromagnetic radiation and matter; applications to solid state and semiconductor laser systems. Prerequisites: EOP 506, or ELE 506/ELE 573, or equivalent. 3 sem. hrs. 

EOP 631. NANOPHOTONICS 
Overview of nanophotonics theory, fabrication technology and characterization techniques. Covers materials topics ranging from quantum confinement and plasmonics to photonic crystals. 3 sem. hrs. 

EOP 632. NANO-FABRICATION LABORATORY 
This laboratory course will provide hands-on experience in state-of-the-art device fabrication technology. The course will be conducted primarily in a clean room laboratory with some classroom sessions for discussions. The students will have an opportunity to design, fabricate and test their own devices. 3 sem. hrs.

EOP 656. FREE SPACE OPTICAL COMMUNICATIONS
Laser beam propagation, random processes, wave propagation in turbulence, turbulence spectra, structure function, coherence length, anisoplanatism, Strehl ratio, scintillation index, long-time and short-time spot size, and beam wander, bit-error rates, adaptive optics corrections, performance analysis. 3 sem. hrs. 

EOP 665. POLARIZATION 

Advanced coverage of polarization measurement methods and theory. Includes Jones calculus and Mueller calculus with applications to ellipsometry. Prerequisite EOP 502. 3 sem. hrs. 

EOP 655. OPTICAL COMMUNICATIONS 
Fiber optics transmission system components and design principles and impairments are examined in detail. Topics include dispersion, absorption, and nonlinearity in fibers; amplifier noise and receiver sensitivity; soliton, coherent, and dispersion-managed communication systems and wave division multiplexing. Prerequisites: EOP 506 and 514 or equivalent. 3 sem. hrs. 

EOP690. SELECTED READINGS IN ELECTRO-OPTICS 
Directed readings in electro-optics areas to be arranged and approved by the chair of the student's Ph.D. advisory committee and the director. 1-3 sem. hrs 

EOP 695. SPECIAL PROBLEMS IN ELECTRO-OPTICS 
Special topics in electro-optics not covered in regular courses. Course sections arranged and approved by the chair of the student's Ph.D. advisory committee and the director. 1- 3 sem. hrs. 

EOP 699. PhD DISSERTATION 
An original research in electro-optics which makes a definite contribution to technical knowledge. Results must be of sufficient importance to merit publication. 1-15 sem. hrs. 

ECE courses related to EO degree 

ECE 507. ELECTROMAGNETIC FIELDS I 
Fundamental concepts, wave equations and its solutions; wave propagation; reflection and transmission; potential theory; construction of solutions; various electromagnetic theorems: concept of source, uniqueness, equivalence, induction and reciprocity theorems. Prerequisite: ECE 333 or equivalent. 3 sem. hrs. 

ECE 518. ELECTROMAGNETIC FIELDS II 
Classification and construction of solutions. Plane cylindrical and spherical wave functions. Integral equations, mathematical theory of diffraction. Green functions. Prerequisite: ECE 507 or equivalent. 3 sem. hrs. 

ECE 521. DIGITAL COMMUNICATIONS I 
Fundamentals of digital transmission of information over noisy channels; modulation schemes for binary and M-ary digital transmission; optimum receivers; coherent and non-coherent detection; signal design; intersymbol interference; error control coding; the Viberti algorithm; channel capacity and Shannon limits on reliable transmission. Prerequisite: ECE 503. 3 sem. hrs. 

ECE 522. DIGITAL COMMUNICATIONS II 
Fundamentals of source coding and compression, Shannon's theorem, Huffinan coding; system synchronization; equalization techniques; multiplexing and multiple access systems; spread- spectrum systems and their applications; pseudo- noise, direct sequence systems, frequency hopping, jamming; encryption and decryption systems. Prerequisite: ECE 521. 3 sem. hrs. 

ECE 561. DIGITAL SIGNAL PROCESSING I 
A study of one-dimensional digital signal processing, including a review of continuous-system and analysis and sampling. Topics include z-transform techniques, digital filter design and analysis, and Fast Fourier Transform processing techniques. Prerequisite: ECE 509. 3 sem. hrs. 

ECE 562. DIGITAL SIGNAL PROCESSING II 
A study of the architectural requirements for one- dimensional digital signal processing. This includes the techniques for the design of both hardware and software elements needed for implementations of digital signal processors as well as discussions of applications to those processors. Prerequisite: ECE 561. 3 sem. hrs. 

ECE 563. IMAGE PROCESSING 
An introduction to image processing including the human visual system, image formats, two-dimensional transforms, and image reconstruction. Prerequisite: ECE 561 3 sem. hrs. 

ECE 663. STATISTICAL PATTERN RECOGNITION 
This course provides a comprehensive treatment of the statistical pattern recognition problem. The mathematical models describing these problems and the mathematical tools necessary for solving them are covered in detail. Prerequisite: ECE 661. 3 sem. hrs.